Banner photo captions: View of Engineering Hall and Maquina fountain from the north.

WS-400A-6NPP/LITE Single Wafer Spin Processor WS-400A-6NPP/LITE Spin Processor
Spin coating is a procedure used to deposit uniform thin films to flat substrates. While the primary use of the WS-400A-6NPP/LITE Single Wafer Spin Processor is to apply photoresist to the surface of a silicon wafer, the instrument can be used for a variety of coatings and substrates. Applications also include etching, developing, cleaning, rinsing and drying. The spin processor housing has been made from PTFE and polypropylene that do not degrade in solvents or generate particles. The compact closed design provides a safe, clean, controlled environment.


Dispense: manual
Programmable parameters: time, speed, acceleration/deceleration
Controller: 20 programs, up to 51 step per program
Purge: nitrogen
Time range/resolution: 0.1 s - 99 min 59.9 s, resolution 0.1 s
Speed: up to 10,000 RPM
Round substrate size: up to 150 mm diameter
Rectangular substrate size: up to 104 mm x 104 mm