Scanning Electron Microscope (SEM) Zeiss LEO 1550VP
Zeiss LEO 1550VP is a high-performance Scanning Electron Microscope (SEM) equipped with a Schottky type field emission gun, various detectors (in-lens and chamber-mount secondary electron detectors, detector for energy-dispersive x-ray analysis), and e-beam patterning system. A close relative to the LEO 1530 SEMs in Materials Science Center, this system is positioned as having a cleaner chamber and better vacuum to optimize the performance for contamination sensitive samples (for example, low contrast self-assembled block-copolymer coatings) and high-resolution patterning. To ensure the clean environment, the SEM is equipped with air lock system for sample exchange without opening the main chamber on atmosphere. Also, some restrictions are applied on the samples allowed in the SEM.
Accelerating voltage: 100 V to 30 kV.
Image resolution: 1.0 nm at 20 kV, 2.5 nm at 1 kV.
In-lens secondary electron detector: standard, used up to 20 kV.
Chamber-mount secondary electron detector: works at > 20 kV. Topography sensitive.
EDS: Thermo Noran Energy dispersive X-ray microanalysis system, a light element detection limit of boron.
Patterning: J.C.Nabity Lithography Systems Nanometer Pattern Generation System (NPGS) ver. 9.1.
Sample stage: motorized 125 mm X travel, 100 mm Y travel, 35 mm Z travel, 0° to 90° tilt, 0° to 360 ° rotation.
Additional equipment: Technics Hummer Jr. Gold sputterer.
Sample restrictions: Samples that are excessively degassing in vacuum or generating particles are not allowed in the instrument.