Banner photo captions: View of Engineering Hall and Maquina fountain from the north.

Filmetrics F20 Thin-Film Measurement System Filmetrics F20 Thin-Film Measurement System
Filmetrics F20 is used to measure the thickness and optical constants (index of refraction and coefficient of extinction) of transparent and semi-transparent thin films. Measured films must be optically smooth. Commonly measured films include semiconductor process films such as oxides, nitrides, resists, and polysilicon, optical coatings such as hardness and anti-reflection coatings, and other industrial coatings such as polyimides and diamond-like carbon. Films that can not be measured include very rough films and opaque films.

Characteristics

Thickness measurement range: 15 nm - 50,000 nm (typical values)
Optical constant measurement range: 100 nm - 4000 nm
Spot size: 0.5 mm
Thickness accuracy: +- 1 nm (at 500 nm thick silicon oxide on Si)
Precision and repeatability: up to 0.1 nm
Sample stages available: SS-1 (reflection, 0-2 mm thick samples) and LA1-RKM (reflection, thick samples)